Micro-mirror Arrays for Maskless Lithography
نویسنده
چکیده
This paper presents a design approach for fabricating an array of MEMS mirrors suitable for maskless lithography applications in a commercial CMOS process. A small footprint mirror design is presented which uses a pair of support beams for signal routing and diagonal gap-closing actuators for mirror deflection. The actuators are shown to be capable of delivering up to 10nN of force per micron of actuator for a supply voltage of 30V, and 0.1nN per micron for a thick gate oxide 0.25μm CMOS supply voltage of 3.3V.
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